Blank detail specifications for pulsed magnetrons 脈沖磁控管空白詳細(xì)規(guī)范
Detail specification for pulse magnetron of type ckm - 6951 Ckm - 6951型脈沖磁控管詳細(xì)規(guī)范
Detail specification for pulsed magnetrons of type ckm - 29 series Ckm - 29型系列脈沖磁控管詳細(xì)規(guī)范
Detail specification for frequency agility pulsed magnetron of type ckm - 709 709a Ckm - 709 709a型捷變頻脈沖磁控管詳細(xì)規(guī)范
Blank detail specification : pulsed magnetrons excluding frequency agile magnetrons ; german version en 136001 : 1992 空白詳細(xì)規(guī)范.脈沖磁控管
Specification for harmonized system of quality assessment for electronic components - blank detail specification : pulsed magnetrons excluding frequency agile magnetrons 電子元件器質(zhì)量評(píng)定協(xié)調(diào)體系規(guī)范.脈沖磁腔管空白詳細(xì)規(guī)范
In the work , mid - frequency pulse magnetron sputtering is used to prepare znoral thin films used as the back reflector of the thin silicon films solar cells . the best techological condition was obtained by optimizing the preparing conditions , ( var is decided by the deposition rate , target voltage : 265v , gas pressure : 0 . 6pa , the high base vacuum is expected 本文采用中頻脈沖磁控濺射法,通過優(yōu)化zno : al薄膜的制備工藝,如靶電壓、本底真空度、工作氣壓、襯底溫度、 o _ 2 ar ,得到可用于硅薄膜太陽能電池背電極的zno : al薄膜。